화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Role of O(D-1) in the oxidation of Si(100)
Kaspar T, Tuan A, Tonkyn R, Hess WP, Rogers JW, Ono Y
Journal of Vacuum Science & Technology B, 21(2), 895, 2003
2 Impact of nitrogen and/or fluorine implantation on deep-submicron Co-salicide process
Chang TY, Lei TF, Chao TS, Chen SW, Kao LM, Chen SK, Tuan A, Su TP
Solid-State Electronics, 46(8), 1097, 2002
3 Interface control in the chemical vapor deposition of titanium dioxide on silicon(100)
Tuan A, Yoon M, Medvedev V, Ono Y, Ma Y, Rogers JW
Thin Solid Films, 377-378, 766, 2000
4 Stabilizing dielectric constant of fluorine-doped SiO2 film by N2O and NH3 plasma post-treatment
Mei YJ, Chang TC, Chang SJ, Pan FM, Chen MSK, Tuan A, Chou S, Chang CY
Thin Solid Films, 308-309, 501, 1997