검색결과 : 1건
| No. | Article |
|---|---|
| 1 |
High-Rate and Highly Selective Anisotropic Etching for WSix/Poly-Si Using Electron-Cyclotron-Resonance Plasma Nojiri K, Tsunokuni K, Yamazaki K Journal of Vacuum Science & Technology B, 14(3), 1791, 1996 |
| No. | Article |
|---|---|
| 1 |
High-Rate and Highly Selective Anisotropic Etching for WSix/Poly-Si Using Electron-Cyclotron-Resonance Plasma Nojiri K, Tsunokuni K, Yamazaki K Journal of Vacuum Science & Technology B, 14(3), 1791, 1996 |