화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Quantifying acid generation efficiency for photoresist applications
Tsiartas PC, Schmid GM, Johnson HF, Stewart MD, Willson CG
Journal of Vacuum Science & Technology B, 23(1), 224, 2005
2 Advancements to the critical ionization dissolution model
Burns SD, Schmid GM, Tsiartas PC, Willson CG, Flanagin L
Journal of Vacuum Science & Technology B, 20(2), 537, 2002
3 Electrostatic effects during dissolution of positive tone photoresists
Schmid GM, Burns SD, Tsiartas PC, Willson CG
Journal of Vacuum Science & Technology B, 20(6), 2913, 2002
4 The Mechanism of Phenolic Polymer Dissolution - A New Perspective
Tsiartas PC, Flanagin LW, Henderson CL, Hinsberg WD, Sanchez IC, Bonnecaze RT, Willson CG
Macromolecules, 30(16), 4656, 1997