검색결과 : 4건
No. | Article |
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1 |
Quantifying acid generation efficiency for photoresist applications Tsiartas PC, Schmid GM, Johnson HF, Stewart MD, Willson CG Journal of Vacuum Science & Technology B, 23(1), 224, 2005 |
2 |
Advancements to the critical ionization dissolution model Burns SD, Schmid GM, Tsiartas PC, Willson CG, Flanagin L Journal of Vacuum Science & Technology B, 20(2), 537, 2002 |
3 |
Electrostatic effects during dissolution of positive tone photoresists Schmid GM, Burns SD, Tsiartas PC, Willson CG Journal of Vacuum Science & Technology B, 20(6), 2913, 2002 |
4 |
The Mechanism of Phenolic Polymer Dissolution - A New Perspective Tsiartas PC, Flanagin LW, Henderson CL, Hinsberg WD, Sanchez IC, Bonnecaze RT, Willson CG Macromolecules, 30(16), 4656, 1997 |