검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Electrical and materials properties of AlN/HfO2 high-k stack with a metal gate Reid KG, Dip A, Sasaki S, Triyoso D, Samavedam S, Gilmer D, Gondran CFH Thin Solid Films, 517(8), 2712, 2009 |
| 2 |
Characterization of nitrogen distribution in HfO2 with low energy secondary ion mass spectrometry Jiang ZX, Kim K, Lerma J, Sieloff D, Luo TY, Yang JY, Triyoso D, Tseng H, Tobin P, Ramani N Journal of Vacuum Science & Technology A, 23(4), 589, 2005 |
| 3 |
Impact of deposition and annealing temperature on material and electrical characteristics of ALD HfO2 Triyoso D, Liu R, Roan D, Ramon M, Edwards NV, Gregory R, Werho D, Kulik J, Tam G, Irwin E, Wang XD, La LB, Hobbs C, Garcia R, Baker J, White BE, Tobin P Journal of the Electrochemical Society, 151(10), F220, 2004 |