검색결과 : 5건
No. | Article |
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1 |
Penultimate effect in radical copolymerization of 2-trifluoromethylacrylates Ito H, Trinque BC, Kasai P, Willson CG Journal of Polymer Science Part A: Polymer Chemistry, 46(5), 1559, 2008 |
2 |
Formation of deprotected fuzzy blobs in chemically amplified resists Jones RL, Hu TJ, Lin EK, Wu WL, Goldfarb DL, Angelopoulos M, Trinque BC, Schmid GM, Stewart MD, Willson CG Journal of Polymer Science Part B: Polymer Physics, 42(17), 3063, 2004 |
3 |
Vinyl ethers in ultraviolet curable formulations for step and flash imprint lithography Kim EK, Stacey NA, Smith BJ, Dickey MD, Johnson SC, Trinque BC, Willson CG Journal of Vacuum Science & Technology B, 22(1), 131, 2004 |
4 |
Recent advances in resists for 157 nm microlithography Trinque BC, Chiba T, Hung RJ, Chambers CR, Pinnow MJ, Osburn BP, Tran HV, Wunderlich J, Hsieh YT, Thomas BH, Shafer G, DesMarteau DD, Conley W, Willson CG Journal of Vacuum Science & Technology B, 20(2), 531, 2002 |
5 |
Metal-catalyzed vinyl addition polymers for 157 nm resist applications. 2. Fluorinated norbornenes: Synthesis, polymerization, and initial imaging results Tran HV, Hung RJ, Chiba T, Yamada S, Mrozek T, Hsieh YT, Chambers CR, Osborn BP, Trinque BC, Pinnow MJ, MacDonald SA, Willson CG, Sanders DP, Connor EF, Grubbs RH, Conley W Macromolecules, 35(17), 6539, 2002 |