화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Penultimate effect in radical copolymerization of 2-trifluoromethylacrylates
Ito H, Trinque BC, Kasai P, Willson CG
Journal of Polymer Science Part A: Polymer Chemistry, 46(5), 1559, 2008
2 Formation of deprotected fuzzy blobs in chemically amplified resists
Jones RL, Hu TJ, Lin EK, Wu WL, Goldfarb DL, Angelopoulos M, Trinque BC, Schmid GM, Stewart MD, Willson CG
Journal of Polymer Science Part B: Polymer Physics, 42(17), 3063, 2004
3 Vinyl ethers in ultraviolet curable formulations for step and flash imprint lithography
Kim EK, Stacey NA, Smith BJ, Dickey MD, Johnson SC, Trinque BC, Willson CG
Journal of Vacuum Science & Technology B, 22(1), 131, 2004
4 Recent advances in resists for 157 nm microlithography
Trinque BC, Chiba T, Hung RJ, Chambers CR, Pinnow MJ, Osburn BP, Tran HV, Wunderlich J, Hsieh YT, Thomas BH, Shafer G, DesMarteau DD, Conley W, Willson CG
Journal of Vacuum Science & Technology B, 20(2), 531, 2002
5 Metal-catalyzed vinyl addition polymers for 157 nm resist applications. 2. Fluorinated norbornenes: Synthesis, polymerization, and initial imaging results
Tran HV, Hung RJ, Chiba T, Yamada S, Mrozek T, Hsieh YT, Chambers CR, Osborn BP, Trinque BC, Pinnow MJ, MacDonald SA, Willson CG, Sanders DP, Connor EF, Grubbs RH, Conley W
Macromolecules, 35(17), 6539, 2002