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| No. | Article |
|---|---|
| 1 |
A systematic investigation of work function in advanced metal gate-HfO2-SiO2 structures with bevel oxide Kuriyama A, Mitard J, Faynot O, Brevard L, Clerc L, Tozzo A, Vidal V, Deleonibus S, Iwai H, Cristoloveanu S Solid-State Electronics, 51(11-12), 1515, 2007 |