검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Neutral gas temperatures measured within a high-density, inductively coupled plasma abatement device Tonnis EJ, Graves DB Journal of Vacuum Science & Technology A, 20(5), 1787, 2002 |
| 2 |
Inductively coupled, point-of-use plasma abatement of perfluorinated compounds and hydrofluorinated compounds from etch processes utilizing O-2 and H2O as additive gases Tonnis EJ, Graves DB, Vartanian VH, Beu L, Lii T, Jewett R Journal of Vacuum Science & Technology A, 18(2), 393, 2000 |