1 |
Time to failure modeling of silver nanowire transparent conducting electrodes and effects of a reduced graphene oxide over layer Kwan YCG, Le QL, Huan CHA Solar Energy Materials and Solar Cells, 144, 102, 2016 |
2 |
Analysis of the Kinetics of Electrochemical Migration on Printed Circuit Boards Using Nernst-Planck Transport Equation He XF, Azarian MH, Pecht MG Electrochimica Acta, 142, 1, 2014 |
3 |
API Standard 521 new alternative method to evaluate fire relief for pressure relief device sizing and depressuring system design Zamejc E Journal of Loss Prevention in The Process Industries, 27, 21, 2014 |
4 |
Failure in a soft gel: Delayed failure and the dynamic yield stress Brenner T, Matsukawa S, Nishinari K, Johannsson R Journal of Non-Newtonian Fluid Mechanics, 196, 1, 2013 |
5 |
Validation of Spring Operated Pressure Relief Valve Time-to-Failure Harris SP, Gross RE Process Safety Progress, 29(1), 55, 2010 |
6 |
Skin effect of on-chip copper interconnects on electromigration Wu W, Yuan JS Solid-State Electronics, 46(12), 2269, 2002 |
7 |
Electromigration subjected to Joule heating under pulsed DC stress Wu W, Yuan JS, Kang SH, Oates AS Solid-State Electronics, 45(12), 2051, 2001 |