화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Elimination of surface scratch/texture on the surface of single crystal Si substrate in chemo-mechanical grinding (CMG) process
Tian YB, Zhou L, Shimizu J, Tashiro Y, Kang RK
Applied Surface Science, 255(7), 4205, 2009
2 Modeling and analyzing on nonuniformity of material removal in chemical mechanical polishing of silicon wafer
Su J, Guo DM, Kang RK, Jin ZJ, Li XJ, Tian YB
Materials Science Forum, 471-472, 26, 2004
3 Investigation on material removal rate in rotation grinding for large-scale silicon wafer
Tian YB, Kang RK, Guo DM, Jin ZJ, Su JX
Materials Science Forum, 471-472, 362, 2004
4 Two-photon absorption spectra of new organic compounds
Lei H, Huang ZL, Wang HZ, Tang XJ, Wu LZ, Zhou GY, Wang D, Tian YB
Chemical Physics Letters, 352(3-4), 240, 2002