검색결과 : 6건
| No. | Article |
|---|---|
| 1 |
Remote plasma sputtering deposited Nb-doped TiO2 with remarkable transparent conductivity Lu L, Guo ML, Thornley S, Han XP, Hu JH, Thwaites MJ, Shao GS Solar Energy Materials and Solar Cells, 149, 310, 2016 |
| 2 |
Remote plasma sputtering of indium tin oxide thin films for large area flexible electronics Yeadon AD, Wakeham SJ, Brown HL, Thwaites MJ, Whiting MJ, Baker MA Thin Solid Films, 520(4), 1207, 2011 |
| 3 |
Low temperature remote plasma sputtering of indium tin oxide for flexible display applications Wakeham SJ, Thwaites MJ, Holton BW, Tsakonas C, Cranton WM, Koutsogeorgis DC, Ranson R Thin Solid Films, 518(4), 1355, 2009 |
| 4 |
Properties of indium tin oxide films deposited using High Target Utilisation Sputtering Calnan S, Upadhyaya HM, Thwaites MJ, Tiwari AN Thin Solid Films, 515(15), 6045, 2007 |
| 5 |
Effects of target bias voltage on indium tin oxide films deposited by high target utilisation sputtering Calnan S, Upadhyaya HM, Dann SE, Thwaites MJ, Tiwari AN Thin Solid Films, 515(24), 8500, 2007 |
| 6 |
Growth of Single-Crystal Si, Ge and SiGe Layers Using Plasma-Assisted CVD Thwaites MJ, Reehal HS Thin Solid Films, 294(1-2), 76, 1997 |