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Recent progress in negative-working photosensitive and thermally stable polymers Higashihara T, Saito Y, Mizoguchi K, Ueda M Reactive & Functional Polymers, 73(2), 303, 2013 |
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Preparation and properties of a novel polytriazole resin Wan LQ, Luo YH, Xue L, Tian JJ, Hu YH, Qi HM, Shen XN, Huang FR, Du L, Chen XB Journal of Applied Polymer Science, 104(2), 1038, 2007 |
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Synthesis and characterization of novel fluorinated polyimides derived from bis[4-(4'-aminophenoxy)phenyl]-3,5-bis(trifluoromethyl)phenyl phosphine oxide Zhu YQ, Zhao PQ, Cai XD, Meng WD, Qing FL Polymer, 48(11), 3116, 2007 |
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Cyclopolymerization. Part XXXII - radical polymerization of alpha-(2-phenylallyloxy)methylstyrene: synthesis of highly cyclized polymers with high glass transition temperatures and thermal stability Lee HJ, Kodaira T, Urushisaki M, Hashimoto T Polymer, 45(22), 7505, 2004 |
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Photosensitive poly(benzoxazole) based on precursor from diphenyl isophthalate and bis(o-aminophenol) Ebara K, Shibasaki Y, Ueda M Polymer, 44(2), 333, 2003 |
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Dicyanovinyl기를 포함하는 폴리아릴레이트의 합성과 그들의 열적 성질 류지헌, 공명선 Polymer(Korea), 20(3), 439, 1996 |