| 1 |
Impact of low-energy ions on plasma deposition of cubic boron nitride
Teii K, Matsumoto S
Thin Solid Films, 576, 50, 2015 |
| 2 |
Mechanism of enhanced wettability of nanocrystalline diamond films by plasma treatment
Yang JHC, Teii K
Thin Solid Films, 520(21), 6566, 2012 |
| 3 |
Enhanced deposition of cubic boron nitride films on roughened silicon and tungsten carbide-cobalt surfaces
Teii K, Hori T, Matsumoto S
Thin Solid Films, 519(6), 1817, 2011 |
| 4 |
Deposition of amorphous hydrogenated carbon films on Si and PMMA by pulsed direct-current plasma CVD
Sung TL, Chao YA, Liu CM, Teii K, Teii S, Hsu CY
Thin Solid Films, 519(20), 6688, 2011 |
| 5 |
In vacuo substrate pretreatments for enhancing nanodiamond formation in electron cyclotron resonance plasma
Teii K, Kouzuma Y, Uchino K
Journal of Vacuum Science & Technology A, 24(5), 1802, 2006 |
| 6 |
Effect of hydrogen plasma exposure on the amount of trans-polyacetylene in nanocrystalline diamond films
Teii K, Ikeda T, Fukutomi A, Uchino K
Journal of Vacuum Science & Technology B, 24(1), 263, 2006 |
| 7 |
Prediction of a threshold density of atomic hydrogen for nanocrystalline diamond growth at low pressures
Teii K
Chemical Physics Letters, 389(4-6), 251, 2004 |
| 8 |
Argon dilution effects on diamond deposition in electron cyclotron resonance plasma: a double probe study
Teii K, Yoshioka H, Ono S, Teii S
Thin Solid Films, 437(1-2), 63, 2003 |
| 9 |
Negative bias dependence of sulfur and fluorine incorporation in diamond films etched by an SF6 plasma
Teii K, Hori M, Goto T
Journal of the Electrochemical Society, 148(2), G55, 2001 |
| 10 |
Study on polymeric neutral species in high-density fluorocarbon plasmas
Teii K, Hori M, Ito M, Goto T, Ishii N
Journal of Vacuum Science & Technology A, 18(1), 1, 2000 |
