검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Space-charge effects in projection electron-beam lithography: Results from the SCALPEL proof-of-lithography system Liddle JA, Blakey MI, Bolan K, Farrow RC, Gallatin GM, Kasica R, Katsap V, Knurek CS, Li J, Mkrtchyan M, Novembre AE, Ocola L, Orphanos PA, Peabody ML, Stanton ST, Teffeau K, Waskiewicz WK, Munro E Journal of Vacuum Science & Technology B, 19(2), 476, 2001 |
| 2 |
Pattern placement correction methodology for 200 mm SCALPEL masks Ocola LE, Farrow RC, Kasica RJ, Caminos CG, Rutberg L, Fullowan RF, Teffeau K, Blakey MI, Peabody ML, Knurek CS, Bogart GR, Novembre AE, Liddle JA, Lercel M, Magg C, Collins K, Trybendis M, Cadwell N, Jeffer R, Dauksher WJ, Resnick DJ, Mancini D, Han SI, Masnyj Z, Smith K, Mangat PJS Journal of Vacuum Science & Technology B, 19(6), 2659, 2001 |