| 1 |
Monitoring and purging dynamics of trace gaseous impurity in atmospheric pressure rapid thermal process
Hu YZ, Tay SP
Journal of Vacuum Science & Technology A, 21(3), 676, 2003 |
| 2 |
Monitoring and purging dynamics of trace gaseous impurity in atmospheric pressure rapid thermal process (vol 21, pg 676, 2003)
Hu YZ, Tay SP
Journal of Vacuum Science & Technology A, 21(4), 1076, 2003 |
| 3 |
Growth and characterization of rapid thermal chlorinated oxides grown using in situ generated HCl
Sharangpani R, Tay SP
Journal of the Electrochemical Society, 148(1), F5, 2001 |
| 4 |
In situ rapid thermal oxidation and reduction of copper thin films and their applications in ultralarge scale integration
Hu YZ, Sharangpani R, Tay SP
Journal of the Electrochemical Society, 148(12), G669, 2001 |
| 5 |
In situ real-time studies of nickel silicide phase formation
Tinani M, Mueller A, Gao Y, Irene EA, Hu YZ, Tay SP
Journal of Vacuum Science & Technology B, 19(2), 376, 2001 |
| 6 |
Characterization of high-K dielectric ZrO2 films annealed by rapid thermal processing
Hu YZ, Tay SP
Journal of Vacuum Science & Technology B, 19(5), 1706, 2001 |
| 7 |
Kinetic investigation of copper film oxidation by spectroscopic ellipsometry and reflectometry
Hu YZ, Sharangpani R, Tay SP
Journal of Vacuum Science & Technology A, 18(5), 2527, 2000 |
| 8 |
Effect of ramp rate on the C49 to C54 titanium disilicide phase transformation from Ti and Ti(Ta)
Smith PM, Bailey G, Hu YZ, Tay SP
Journal of Vacuum Science & Technology B, 18(4), 1949, 2000 |
| 9 |
Spectroscopic ellipsometry investigation of silicide formation by rapid thermal process
Hu YZ, Tay SP
Journal of Vacuum Science & Technology B, 17(5), 2284, 1999 |
| 10 |
Spectroscopic ellipsometry investigation of nickel silicide formation by rapid thermal process
Hu YZ, Tay SP
Journal of Vacuum Science & Technology A, 16(3), 1820, 1998 |
