검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Crystallinity of Electrically Scaled Atomic Layer Deposited HfO2 from a Cyclical Deposition and Annealing Scheme Consiglio S, Clark RD, Bersch E, LaRose JD, Wells I, Tapily K, Leusink GJ, Diebold AC Journal of the Electrochemical Society, 159(6), G80, 2012 |
| 2 |
Silicidation of Niobium Deposited on Silicon by Physical Vapor Deposition Ndoye C, Tapily K, Orlowski M, Baumgart H, Gu DF Journal of the Electrochemical Society, 158(9), H897, 2011 |
| 3 |
Experimental study of ALD HfO2 deposited on strained silicon-on-insulator and standard SOI Gu D, Tapily K, Shrestha P, Zhu MY, Celler G, Baumgart H Journal of the Electrochemical Society, 155(6), G129, 2008 |
| 4 |
Nanoindentation investigation of HfO2 and Al2O3 films grown by atomic layer deposition Tapily K, Jakes JE, Stone DS, Shrestha P, Gu D, Baumgart H, Elmustafa AA Journal of the Electrochemical Society, 155(7), H545, 2008 |