| 1 |
Visible light driven TaON/V2O5 heterojunction photocatalyst for deep elimination of volatile-aromatic compounds
Wang SM, Li ZY, Guan Y, Lu L, Shi Z, Weng P, Yan SC, Zou ZG
Applied Catalysis B: Environmental, 245, 220, 2019 |
| 2 |
Synthesis of vanadium doped tantalum oxy-nitride for photocatalytic reduction of carbon dioxide under visible light
Chi NTPL, Cam NTD, Thuan DV, Truong TT, Truc NTT, Hoang CV, Phuong TTT, Pham TD, Tung MHT, Thu NTM, Phuong NM, Nguyen VN
Applied Surface Science, 467, 1249, 2019 |
| 3 |
Rh nanospheres anchored TaON@Ta2O5 nanophotocatalyst for efficient hydrogen evolution from photocatalytic water splitting under visible light irradiation
Jiang HQ, Zhang W, Zang SY, Zhang WL
International Journal of Hydrogen Energy, 44(44), 24218, 2019 |
| 4 |
New Method for the Synthesis of ss-TaON Oxynitride Using (C6N9H3)(n)
Ueda K, Inaguma Y, Asakura Y, Yin S
Chemistry Letters, 47(7), 840, 2018 |
| 5 |
Ni(OH)(2) loaded on TaON for enhancing photocatalytic water splitting activity under visible light irradiation
Chen W, Chu MC, Gao L, Mao LQ, Yuan J, Shangguan WF
Applied Surface Science, 324, 432, 2015 |
| 6 |
Roles of TaON and Ta3N5 in the visible-Fenton-like degradation of atrazine
Du YX, Zhao L, Zhang YY
Journal of Hazardous Materials, 267, 55, 2014 |
| 7 |
Three-dimensional Z-scheme AgCl/Ag/gamma-TaON heterostructural hollow spheres for enhanced visible-light photocatalytic performance
Hou JG, Yang C, Wang Z, Ji QH, Li YT, Huang GC, Jiao SQ, Zhu HM
Applied Catalysis B: Environmental, 142, 579, 2013 |
| 8 |
Coupling of narrow and wide band-gap semiconductors on uniform films active in bacterial disinfection under low intensity visible light: Implications of the interfacial charge transfer (IFCT)
Rtimi S, Sanjines R, Pulgarin C, Houas A, Lavanchy JC, Kiwi J
Journal of Hazardous Materials, 260, 860, 2013 |
| 9 |
The resistive switching characteristics in TaON films for nonvolatile memory applications
Chen MC, Chang TC, Chiu YC, Chen SC, Huang SY, Chang KC, Tsai TM, Yang KH, Sze SM, Tsai MJ
Thin Solid Films, 528, 224, 2013 |
| 10 |
Highly uniform low-power resistive memory using nitrogen-doped tantalum pentoxide
Cheng CH, Chen PC, Wu YH, Wu MJ, Yeh FS, Chin A
Solid-State Electronics, 73, 60, 2012 |
