화학공학소재연구정보센터
검색결과 : 30건
No. Article
1 Analytical comparison of atomic layer deposition of oxide films inside trench and hole nanostructures
Fadeev AV, Rudenko KV
Thin Solid Films, 672, 83, 2019
2 A new high-voltage interconnection shielding method for SOI monolithic ICs
Zhang L, Zhu J, Sun WF, Huang XQ, Zhao MN, Chen JJ, Shi LX, Chen J, Ding DS
Solid-State Electronics, 133, 25, 2017
3 LNG trench dispersion modeling using computational fluid dynamics
Melton TA, Cornwell JB
Journal of Loss Prevention in The Process Industries, 23(6), 762, 2010
4 Electrochemical deposition in deep vias
Neogi P
AIChE Journal, 52(1), 354, 2006
5 LP-CVD silicon-based film formation in submicrometer trenches in industrial equipment: Experiments and simulation
Gris H, Caussat B, Cot D, Durand J, Couderc JP
Advanced Materials, 14(17), A213, 2002
6 Strain induced by Ti salicidation in sub-quarter-micron CMOS devices, as measured by TEM/CBED
Benedetti A, Cullis AG, Armigliato A, Balboni R, Frabboni S, Mastracchio GF, Pavia G
Applied Surface Science, 188(1-2), 214, 2002
7 Mask charging and profile evolution during chlorine plasma etching of silicon
Bogart KHA, Klemens FP, Malyshev MV, Colonell JI, Donnelly VM, Lee JTC, Lane JM
Journal of Vacuum Science & Technology A, 18(1), 197, 2000
8 Chemical reaction engineering in the design of CVD reactors
Komiyama H, Shimogaki Y, Egashira Y
Chemical Engineering Science, 54(13-14), 1941, 1999
9 Coverage simulation for non-liner surface reaction
Kim B, Akiyama Y, Imaishi N
KAGAKU KOGAKU RONBUNSHU, 25(3), 466, 1999
10 Direct nano-printing on Al substrate using a SiC mold
Pang SW, Tamamura T, Nakao M, Ozawa A, Masuda H
Journal of Vacuum Science & Technology B, 16(3), 1145, 1998