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Exploration and optimization of ZrCo(Ti) type film for high hydrogen density and thermal stability of the hydride Luo WH, Kou HQ, Huang X, Ye RX, Bao JC, He H, Tang T, Huang ZY, Sang G International Journal of Hydrogen Energy, 45(31), 15530, 2020 |
2 |
Influence of Ni13+ ions irradiation on the microstructure, mechanical and tribological properties of Mo-S-Ti composite films Duan ZW, Zhao XY, Xu J, Wang P, Liu WM Applied Surface Science, 480, 438, 2019 |
3 |
Electrical Properties and Microstructures in Ti Films Deposited by TFT dc Sputtering Han CS, Jeon SJ Korean Journal of Materials Research, 26(4), 207, 2016 |
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Water surface coverage effects on reactivity of plasma oxidized Ti films Pranevicius L, Pranevicius LL, Vilkinis P, Baltaragis S, Gedvilas K Applied Surface Science, 295, 240, 2014 |
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Effect of sputtering power on surface topography of dc magnetron sputtered Ti thin films observed by AFM Jin YZ, Wu W, Li L, Chen J, Zhang JY, Zuo YB, Fu J Applied Surface Science, 255(8), 4673, 2009 |
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Microstructure analyses of the titanium films formed by the ionized sputtering process Ko DH, Kim EH, Choi S, Yoo BY, Lee HD Thin Solid Films, 340(1-2), 13, 1999 |
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Dopant effects on lateral silicide growth in self-aligned titanium silicide process Park JS, Byun JS, Sohn DK, Lee BH, Park JW, Kim JJ Journal of the Electrochemical Society, 145(10), 3585, 1998 |
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Transmission Electron-Microscopy of the Sequence of Phase-Formation in the Interfacial Solid-Phase Reactions in Ta/Si Systems Noya A, Takeyama M, Sasaki K, Aoyagi E, Hiraga K Journal of Vacuum Science & Technology A, 15(2), 253, 1997 |
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Thermal-Stability of Cu/W/Si Contact Systems Using Layers of Cu(111) and W(110) Preferred Orientations Takeyama M, Noya A, Fukuda T Journal of Vacuum Science & Technology A, 15(2), 415, 1997 |
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The Influence of Multilayered Kinetics on the Selection of the Primary Phase During the Diffusion-Controlled Growth of Titanium-Silicide Layers Cockeram B, Wang G Thin Solid Films, 269(1-2), 57, 1995 |