화학공학소재연구정보센터
검색결과 : 10건
No. Article
1 Exploration and optimization of ZrCo(Ti) type film for high hydrogen density and thermal stability of the hydride
Luo WH, Kou HQ, Huang X, Ye RX, Bao JC, He H, Tang T, Huang ZY, Sang G
International Journal of Hydrogen Energy, 45(31), 15530, 2020
2 Influence of Ni13+ ions irradiation on the microstructure, mechanical and tribological properties of Mo-S-Ti composite films
Duan ZW, Zhao XY, Xu J, Wang P, Liu WM
Applied Surface Science, 480, 438, 2019
3 Electrical Properties and Microstructures in Ti Films Deposited by TFT dc Sputtering
Han CS, Jeon SJ
Korean Journal of Materials Research, 26(4), 207, 2016
4 Water surface coverage effects on reactivity of plasma oxidized Ti films
Pranevicius L, Pranevicius LL, Vilkinis P, Baltaragis S, Gedvilas K
Applied Surface Science, 295, 240, 2014
5 Effect of sputtering power on surface topography of dc magnetron sputtered Ti thin films observed by AFM
Jin YZ, Wu W, Li L, Chen J, Zhang JY, Zuo YB, Fu J
Applied Surface Science, 255(8), 4673, 2009
6 Microstructure analyses of the titanium films formed by the ionized sputtering process
Ko DH, Kim EH, Choi S, Yoo BY, Lee HD
Thin Solid Films, 340(1-2), 13, 1999
7 Dopant effects on lateral silicide growth in self-aligned titanium silicide process
Park JS, Byun JS, Sohn DK, Lee BH, Park JW, Kim JJ
Journal of the Electrochemical Society, 145(10), 3585, 1998
8 Transmission Electron-Microscopy of the Sequence of Phase-Formation in the Interfacial Solid-Phase Reactions in Ta/Si Systems
Noya A, Takeyama M, Sasaki K, Aoyagi E, Hiraga K
Journal of Vacuum Science & Technology A, 15(2), 253, 1997
9 Thermal-Stability of Cu/W/Si Contact Systems Using Layers of Cu(111) and W(110) Preferred Orientations
Takeyama M, Noya A, Fukuda T
Journal of Vacuum Science & Technology A, 15(2), 415, 1997
10 The Influence of Multilayered Kinetics on the Selection of the Primary Phase During the Diffusion-Controlled Growth of Titanium-Silicide Layers
Cockeram B, Wang G
Thin Solid Films, 269(1-2), 57, 1995