화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Effects of Water-Vapor and Chlorine on the Epitaxial-Growth of Si1-xGex Films by Chemical-Vapor-Deposition - Thermodynamic Analysis
Lee IM, Jansons A, Takoudis CG
Journal of Vacuum Science & Technology B, 15(4), 880, 1997
2 Characterization of Si1-xGex Epilayers Grown Using a Commercially Available Ultrahigh-Vacuum Chemical-Vapor-Deposition Reactor
Lafontaine H, Houghton DC, Elliot D, Rowell NL, Baribeau JM, Laframboise S, Sproule GI, Rolfe SJ
Journal of Vacuum Science & Technology B, 14(3), 1675, 1996
3 Growth of Er-Doped Si Films by Electron-Cyclotron-Resonance Plasma-Enhanced Chemical-Vapor-Deposition
Rogers JL, Varhue WJ, Adams E, Lavoie MA, Frenette RO
Journal of Vacuum Science & Technology A, 12(5), 2762, 1994