| 1 |
Improvement of chemical, physical, and electrical properties of parylene-D deposited by chemical vapor deposition by controlling the parameters process
Mokni M, Kahouli A, Jomni F, Garden JL, Andre E, Sylvestre A
Materials Chemistry and Physics, 186, 598, 2017 |
| 2 |
Structural and dielectric characterization of sputtered Tantalum Titanium Oxide thin films for high temperature capacitor applications
Rouahi A, Challali F, Dakhlaoui I, Vallee C, Salimy S, Jomni F, Yangui B, Besland MP, Goullet A, Sylvestre A
Thin Solid Films, 606, 127, 2016 |
| 3 |
Dielectric Investigation of Parylene D Thin Films: Relaxation and Conduction Mechanisms
Mokni M, Kahouli A, Jomni F, Garden JL, Andre E, Sylvestre A
Journal of Physical Chemistry A, 119(35), 9210, 2015 |
| 4 |
Evaluation of Activation Parameters of Molecular Mobility of Parylene C Using Differential Scanning Calorimetry, Dielectric Spectroscopy, and Thermally Stimulated Depolarization Currents
Kahouli A, Sylvestre A, Jomni F, Yangui B
Journal of Physical Chemistry A, 118(8), 1320, 2014 |
| 5 |
Structural and dielectric properties of parylene-VT4 thin films
Kahouli A, Sylvestre A, Laithier JF, Lutsen L, Pairis S, Andre E, Garden JL
Materials Chemistry and Physics, 143(3), 908, 2014 |
| 6 |
Experimental and Theoretical Study of AC Electrical Conduction Mechanisms of Semicrystalline Parylene C Thin Films
Kahouli A, Sylvestre A, Jomni F, Yangui B, Legrand J
Journal of Physical Chemistry A, 116(3), 1051, 2012 |
| 7 |
Effect of Cl-H aromatic substitution on structural and dielectric properties of poly(p-xylylene)
Kahouli A, Sylvestre A, Pairis S, Laithier JF
Polymer, 53(14), 3001, 2012 |
| 8 |
Dielectric properties of parylene AF4 as low-k material for microelectronic applications
Kahouli A, Sylvestre A, Jomni F, Andre E, Garden JL, Yangui B, Berge B, Legrand J
Thin Solid Films, 520(7), 2493, 2012 |
| 9 |
Electrical properties of amorphous barium titanate films sputter deposited under hydrogen containing atmosphere
El Kamel F, Gonon P, Sylvestre A, Vallee C
Journal of Vacuum Science & Technology B, 27(1), 373, 2009 |
| 10 |
Permittivity and conductivity of low-dielectric-constant SiOC : H films deposited by plasma-enhanced chemical vapor deposition
Gonon P, Sylvestre A, Meynen H, Van Cotthem L
Journal of the Electrochemical Society, 150(3), F47, 2003 |
