화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Detailed investigation of the surface mechanisms and their interplay with transport phenomena in alumina atomic layer deposition from TMA and water
Gakis GP, Vergnes H, Scheid E, Vahlas C, Boudouvis AG, Caussat B
Chemical Engineering Science, 195, 399, 2019
2 Expression of the Si etch rate in a CF4 plasma with four internal process variables
Cho BO, Hwang SW, Kim IW, Moon SH
Journal of the Electrochemical Society, 146(1), 350, 1999
3 Electrochemical impedance spectroscopic study of dimensionally stable anode corrosion
Alves VA, da Silva LA, Boodts JFC
Journal of Applied Electrochemistry, 28(9), 899, 1998