화학공학소재연구정보센터
검색결과 : 8건
No. Article
1 Influence of partial charge on the material removal rate during chemical polishing
Suratwala T, Steele R, Miller PE, Wong LN, Destino JF, Feigenbaum E, Shen N, Feit M
Journal of the American Ceramic Society, 102(4), 1566, 2019
2 Nanoplastic removal function and the mechanical nature of colloidal silica slurry polishing
Shen N, Feigenbaum E, Suratwala T, Steele W, Wong LN, Feit MD, Miller PE
Journal of the American Ceramic Society, 102(6), 3141, 2019
3 Relationship between surface -roughness and interface slurry particle spatial distribution during glass polishing
Suratwala T, Steele W, Feit M, Shen N, Wong L, Dylla-Spears R, Desjardin R, Elhadj S, Miller P
Journal of the American Ceramic Society, 100(7), 2790, 2017
4 Nanoscratching of Optical Glass Surfaces Near the Elastic-Plastic Load Boundary to Mimic the Mechanics of Polishing Particles
Shen N, Suratwala T, Steele W, Wong L, Feit MD, Miller PE, Dylla-Spears R, Desjardin R
Journal of the American Ceramic Society, 99(5), 1477, 2016
5 Mechanism and Simulation of Removal Rate and Surface Roughness During Optical Polishing of Glasses
Suratwala T, Steele W, Feit M, Shen N, Dylla-Spears R, Wong L, Miller P, Desjardin R, Elhadj S
Journal of the American Ceramic Society, 99(6), 1974, 2016
6 Chemistry and Formation of the Beilby Layer During Polishing of Fused Silica Glass
Suratwala T, Steele W, Wong L, Feit MD, Miller PE, Dylla-Spears R, Shen N, Desjardin R
Journal of the American Ceramic Society, 98(8), 2395, 2015
7 Microscopic Removal Function and the Relationship Between Slurry Particle Size Distribution and Workpiece Roughness During Pad Polishing
Suratwala T, Feit M, Steele W, Wong L, Shen N, Dylla-Spears R, Desjardin R, Mason D, Geraghty P, Miller P, Baxamusa S
Journal of the American Ceramic Society, 97(1), 81, 2014
8 Influence of Temperature and Material Deposit on Material Removal Uniformity during Optical Pad Polishing
Suratwala T, Feit MD, Steele WA, Wong LL
Journal of the American Ceramic Society, 97(6), 1720, 2014