검색결과 : 1건
No. | Article |
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Etching mechanisms of HfO2, SiO2, and poly-Si substrates in BCl3 plasmas Sungauer E, Pargon E, Mellhaoui X, Ramos R, Cunge G, Vallier L, Joubert O, Lill T Journal of Vacuum Science & Technology B, 25(5), 1640, 2007 |
No. | Article |
---|---|
1 |
Etching mechanisms of HfO2, SiO2, and poly-Si substrates in BCl3 plasmas Sungauer E, Pargon E, Mellhaoui X, Ramos R, Cunge G, Vallier L, Joubert O, Lill T Journal of Vacuum Science & Technology B, 25(5), 1640, 2007 |