| 1 |
High-field scanning probe lithography in hexadecane: Transitioning from field induced oxidation to solvent decomposition through surface modification
Suez I, Rolandi M, Backer SA, Scholl A, Doran A, Okawa D, Zettl A, Frechet JMJ
Advanced Materials, 19(21), 3570, 2007 |
| 2 |
Evaluation of new materials for plasmonic imaging lithography at 476 nm using near field scanning optical microscopy
Backer SA, Suez I, Fresco ZM, Frechet JMJ, Conway JA, Vedantam S, Lee H, Yablonovitch E
Journal of Vacuum Science & Technology B, 25(4), 1336, 2007 |
| 3 |
Covalent formation of nanoscale fullerene and dendrimer patterns
Backer SA, Suez I, Fresco ZM, Rolandi M, Frechet JMJ
Langmuir, 23(5), 2297, 2007 |
| 4 |
AFM-induced amine deprotection: Triggering localized bond cleavage by application of tip/substrate voltage bias for the surface self-assembly of nanosized dendritic objects
Fresco ZM, Suez I, Backer SA, Frechet JMJ
Journal of the American Chemical Society, 126(27), 8374, 2004 |
| 5 |
Characterization and modeling of volumetric and mechanical properties for step and flash imprint lithography photopolymers
Colburn M, Suez I, Choi BJ, Meissl M, Bailey T, Sreenivasan SV, Ekerdt JG, Willson CG
Journal of Vacuum Science & Technology B, 19(6), 2685, 2001 |
