화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Smooth and high quality epitaxial strained Ge grown on SiGe strain relaxed buffers with 70-85% Ge
Loo R, Souriau L, Ong P, Kenis K, Rip J, Storck P, Buschhardt T, Vorderwestner M
Journal of Crystal Growth, 324(1), 15, 2011
2 Antimony surfactant for epitaxial growth of SiGe buffer layers at high deposition temperatures
Storck P, Vorderwestner M, Kondratyev A, Talalaev R, Amamchyan A, Woelk E
Thin Solid Films, 518, S23, 2010
3 Structure and defects of epitaxial Si(111) layers on Y2O3(111)/Si(111) support systems
Borschel C, Ronning C, Hofsass H, Giussani A, Zaumseil P, Wenger C, Storck P, Schroeder T
Journal of Vacuum Science & Technology B, 27(1), 305, 2009
4 Kinetics of SiGe chemical vapor deposition from chloride precursors
Lovtsus AA, Segal AS, Sid'ko AP, Talalaev RA, Storck P, Kadinski L
Journal of Crystal Growth, 287(2), 446, 2006