검색결과 : 15건
| No. | Article |
|---|---|
| 1 |
Defect analysis for patterned media Ye ZM, Fretwell J, Luo K, Ha S, Schmid G, LaBrake D, Resnick DJ, Sreenivasan SV Journal of Vacuum Science & Technology B, 28(6), C6M7, 2010 |
| 2 |
Step and flash imprint lithography for manufacturing patterned media Schmid GM, Miller M, Brooks C, Khusnatdinov N, LaBrake D, Resnick DJ, Sreenivasan SV, Gauzner G, Lee K, Kuo D, Weller D, Yang XM Journal of Vacuum Science & Technology B, 27(2), 573, 2009 |
| 3 |
High-aspect ratio polymeric pillar arrays formed via electrohydrodynamic patterning Dickey MD, Raines A, Collister E, Bonnecaze RT, Sreenivasan SV, Willson CG Journal of Materials Science, 43(1), 117, 2008 |
| 4 |
Patterned wafer defect density analysis of step and flash imprint lithography McMackin I, Martin W, Perez J, Selinidis K, Maltabes J, Xu F, Resnick D, Sreenivasan SV Journal of Vacuum Science & Technology B, 26(1), 151, 2008 |
| 5 |
Full field imprint masks using variable shape beam pattern generators Selinidis K, Thompson E, Schmid G, Stacey N, Perez J, Maltabes J, Sreenivasan SV, Resnick DJ, Fujii A, Sakai Y, Sasaki S, Hayashi N Journal of Vacuum Science & Technology B, 26(6), 2410, 2008 |
| 6 |
Compliant pin chuck for minimizing the effect of backside particles on wafer planarity Nimmakayala PK, Sreenivasan SV Journal of Vacuum Science & Technology B, 22(6), 3147, 2004 |
| 7 |
Diffractive x-ray optics using production fabrication methods Stein A, Jacobsen C, Evans-Lutterodt K, Tennant DM, Bogart G, Klemens F, Ocola LE, Choi BJ, Sreenivasan SV Journal of Vacuum Science & Technology B, 21(1), 214, 2003 |
| 8 |
Imprint lithography for integrated circuit fabrication Resnick DJ, Dauksher WJ, Mancini D, Nordquist KJ, Bailey TC, Johnson S, Stacey N, Ekerdt JG, Willson CG, Sreenivasan SV, Schumaker N Journal of Vacuum Science & Technology B, 21(6), 2624, 2003 |
| 9 |
Characterization of and imprint results using indium tin oxide-based step and flash imprint lithography templates Dauksher WJ, Nordquist KJ, Mancini DP, Resnick DJ, Baker JH, Hooper AE, Talin AA, Bailey TC, Lemonds AM, Sreenivasan SV, Ekerdt JG, Willson CG Journal of Vacuum Science & Technology B, 20(6), 2857, 2002 |
| 10 |
Hydrogen silsesquioxane for direct electron-beam patterning of step and flash imprint lithography templates Mancini DP, Gehoski KA, Ainley E, Nordquist KJ, Resnick DJ, Bailey TC, Sreenivasan SV, Ekerdt JG, Willson CG Journal of Vacuum Science & Technology B, 20(6), 2896, 2002 |