검색결과 : 1건
| No. | Article |
|---|---|
| 1 |
Process optimizations to recessed e-SiGe source/drain for performance enhancement in 22 nm all-last high-k/metal-gate pMOSFETs Qin CL, Wang GL, Hong PZ, Liu JB, Yin HX, Yin HZ, Ma XL, Cui HS, Lu YH, Meng LK, Xiang JJ, Zhong HC, Zhu HL, Xu QX, Li JF, Yan J, Zhao C, Radamson HH Solid-State Electronics, 123, 38, 2016 |