검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Nitridation and oxynitridation of Si to control interfacial reaction with HfO2 Katarnreddy R, Inman R, Jursich G, Soulet A, Takoudis C Thin Solid Films, 516(23), 8498, 2008 |
| 2 |
ALD and characterization of aluminum oxide deposited on Si(100) using tris(diethylamino) aluminum and water vapor (vol 153, pg C701, 2006) Katamreddy R, Inman R, Jursich G, Soulet A, Takoudis C Journal of the Electrochemical Society, 154(4), S5, 2007 |
| 3 |
Post deposition annealing of aluminum oxide deposited by atomic layer deposition using tris(diethylamino)aluminum and water vapor on Si(100) Katamreddy R, Inman R, Jursich G, Soulet A, Nicholls A, Takoudis C Thin Solid Films, 515(17), 6931, 2007 |
| 4 |
ALD and characterization of aluminum oxide deposited on Si (100) using tris(diethylamino) aluminum and water vapor Katamreddy R, Inman R, Jursich G, Soulet A, Takoudis C Journal of the Electrochemical Society, 153(10), C701, 2006 |
| 5 |
Microstructure and plastic anisotropy in rolled Al-Mg alloys. Eardley ES, Soulet A, Court SA, Humphreys FJ, Bate PS Materials Science Forum, 426-4, 363, 2003 |