검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Hydrogen plasma removal of post-RIE residue for backend processing Somashekhar A, Ying H, Smith PB, Aldrich DB, Nemanich RJ Journal of the Electrochemical Society, 146(6), 2318, 1999 |
| 2 |
Etching SiO2-Films in Aqueous 0.49-Percent HF Somashekhar A, Obrien S Journal of the Electrochemical Society, 143(9), 2885, 1996 |