검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Real-time, noninvasive monitoring of on energy and ion current at a wafer surface during plasma etching Sobolewski MA Journal of Vacuum Science & Technology A, 24(5), 1892, 2006 |
| 2 |
Effect of changing the electrode gap on the spatial and electrical properties Of O-2/CF4 plasmas Steffens KL, Sobolewski MA Journal of Vacuum Science & Technology A, 21(1), 241, 2003 |
| 3 |
Planar laser-induced fluorescence of CF2 in O-2/CF4 and O-2/C2F6 chamber-cleaning plasmas: Spatial uniformity and comparison to electrical measurements Steffens KL, Sobolewski MA Journal of Vacuum Science & Technology A, 17(2), 517, 1999 |
| 4 |
Electrical control of the spatial uniformity of reactive species in plasmas Sobolewski MA, Steffens KL Journal of Vacuum Science & Technology A, 17(6), 3281, 1999 |
| 5 |
Electrical optimization of plasma-enhanced chemical vapor deposition chamber cleaning plasmas Sobolewski MA, Langan JG, Felker BS Journal of Vacuum Science & Technology B, 16(1), 173, 1998 |