검색결과 : 4건
No. | Article |
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1 |
HfSiO4 dielectric layers deposited by ALD using HfCl4 and NH2(CH2)(3)Si(OC2H5)(3) precursors Rittersma ZM, Roozeboom F, Verheijen MA, van Berkum JGM, Dao T, Snijders JHM, Vainonen-Ahlgren E, Tois E, Tuominen M, Haukka S Journal of the Electrochemical Society, 151(11), C716, 2004 |
2 |
Quantitative depth profiling of SiOxNy layers on Si van Berkum JGM, Hopstaken MJP, Snijders JHM, Tamminga Y, Cubaynes FN Applied Surface Science, 203, 414, 2003 |
3 |
Reduction of mercury loss in fluorescent lamps coated with thin metal-oxide films Hildenbrand VD, Denissen CJM, van der Pol AJHP, Hendriks AHC, van der Marel C, Snijders JHM, Tamminga Y, Brongersma HH, Viitanen MM Journal of the Electrochemical Society, 150(7), H147, 2003 |
4 |
Interactions of thin oxide films with a low-pressure mercury discharge Hildenbrand VD, Denissen CJM, Geerdinck LM, van der Marel C, Snijders JHM, Tamminga Y Thin Solid Films, 371(1-2), 295, 2000 |