화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 HfSiO4 dielectric layers deposited by ALD using HfCl4 and NH2(CH2)(3)Si(OC2H5)(3) precursors
Rittersma ZM, Roozeboom F, Verheijen MA, van Berkum JGM, Dao T, Snijders JHM, Vainonen-Ahlgren E, Tois E, Tuominen M, Haukka S
Journal of the Electrochemical Society, 151(11), C716, 2004
2 Quantitative depth profiling of SiOxNy layers on Si
van Berkum JGM, Hopstaken MJP, Snijders JHM, Tamminga Y, Cubaynes FN
Applied Surface Science, 203, 414, 2003
3 Reduction of mercury loss in fluorescent lamps coated with thin metal-oxide films
Hildenbrand VD, Denissen CJM, van der Pol AJHP, Hendriks AHC, van der Marel C, Snijders JHM, Tamminga Y, Brongersma HH, Viitanen MM
Journal of the Electrochemical Society, 150(7), H147, 2003
4 Interactions of thin oxide films with a low-pressure mercury discharge
Hildenbrand VD, Denissen CJM, Geerdinck LM, van der Marel C, Snijders JHM, Tamminga Y
Thin Solid Films, 371(1-2), 295, 2000