검색결과 : 12건
| No. | Article |
|---|---|
| 1 |
Iterative identification of temperature dynamics in single wafer rapid thermal processing Cho WH, Edgar TF, Lee JT Korean Journal of Chemical Engineering, 26(2), 307, 2009 |
| 2 |
Effects of water and iso-propyl alcohol relative humidities on single wafer cleaning system performance Koo J, Kim T, Jung C, Lee J, Kim T International Journal of Heat and Mass Transfer, 50(21-22), 4275, 2007 |
| 3 |
Mathematical Modeling for Chemical Vapor Deposition in a Single-Wafer Reactor: Application to Low-Pressure Deposition of Tungsten Park JH Korean Journal of Chemical Engineering, 19(3), 391, 2002 |
| 4 |
Formation of high conductivity WSix layer and its characterization as a gate electrode Byun JS, Lee BH, Park JS, Sohn DK, Choi SJ, Kim JJ Journal of the Electrochemical Society, 145(9), 3228, 1998 |
| 5 |
Numerical approach for modeling and designing silicon epitaxial growth Habuka H KAGAKU KOGAKU RONBUNSHU, 24(4), 527, 1998 |
| 6 |
Design and Scale-Up of Chemical-Vapor-Deposition Reactors for Semiconductor Processing Kleijn CR, Kuijlaars KJ, Vandenakker HE Chemical Engineering Science, 51(10), 2119, 1996 |
| 7 |
DEPOSITION UNIFORMITIES ON A WAFER AND IN A TRENCH FOR TUNGSTEN SILICIDE LPCVD IN A SINGLE-WAFER REACTOR Park JH Korean Journal of Chemical Engineering, 13(2), 105, 1996 |
| 8 |
Modeling and Control of Microelectronics Materials Processing Badgwell TA, Breedijk T, Bushman SG, Butler SW, Chatterjee S, Edgar TF, Toprac AJ, Trachtenberg I Computers & Chemical Engineering, 19(1), 1, 1995 |
| 9 |
A Detailed Model for Low-Pressure CVD of Tungsten Kuijlaars KJ, Kleijn CR, Vandenakker HE Thin Solid Films, 270(1-2), 456, 1995 |
| 10 |
Effect of Carrier Gases on the Chemical-Vapor-Deposition of Tungsten from Wf6-SiH4 Choi HS, Rhee SW Journal of the Electrochemical Society, 141(2), 475, 1994 |