| 1 |
Thermodynamic Simulation of Polysilicon Production in Si-H-Cl System by Modified Siemens Process
Zhou YM, Hou YQ, Nie ZF, Xie G, Ma WH, Dai YN, Ramachandran PA
Journal of Chemical Engineering of Japan, 50(7), 457, 2017 |
| 2 |
In situ analysis of surface morphology and viscoelastic effects during deposition of thin silicon layers from 1-butyl-1-methylpyrrolidinium bis(trifluoromethylsulfonyl)imide
Ivanov S, Vlaic C, Bund A, Efimov I
Electrochimica Acta, 219, 251, 2016 |
| 3 |
Hydroxyapatite-silicon film deposited on Ti-Nb-10Zr by electrochemical and magnetron sputtering method
Jeong YH, Choe HC, Brantley WA
Thin Solid Films, 620, 114, 2016 |
| 4 |
Effect of Gas Flow Rate on the High-Rate, Localized Jet-Deposition of Silicon in SiH4/H-2 PE-CVD
Nishida S, Muta H, Kuribayashi S
Journal of Chemical Engineering of Japan, 47(6), 478, 2014 |
| 5 |
Mechanism of immersion deposition of Ni-P films on Si(100) in an aqueous alkaline solution containing sodium hypophosphite
Hsu HF, Tsai CL, Lee CW, Wu HY
Thin Solid Films, 517(17), 4786, 2009 |
| 6 |
A simple tool for quality evaluation of the microcrystalline silicon prepared at high growth rate
Kocka J, Mates T, Ledinsky M, Stuchlikova H, Stuchlik J, Fejfar A
Thin Solid Films, 516(15), 4966, 2008 |
| 7 |
Nickel pulse reversal plating for image reversal of ultrathin electron beam resist
Awad Y, Lavallee E, Beauvais J, Drouin D, Mun LK, Yang P, Cloutier M, Turcotte D
Thin Solid Films, 515(5), 3040, 2007 |
| 8 |
Piezoelectric photothermal study of the optical properties of microcrystalline silicon near the bandgap
Fukuyama A, Sakamoto S, Sonoda S, Wang P, Sakai K, Ikari T
Thin Solid Films, 511, 112, 2006 |
| 9 |
Solar cell research and development using the hot wire CVD process
Mahan AH
Solar Energy, 77(6), 931, 2004 |
| 10 |
The effects of RF plasma excitation frequency and doping gas on the deposition of polymorphous silicon thin films
Suendo V, Kharchenko AV, Cabarrocas PRI
Thin Solid Films, 451-52, 259, 2004 |
