| 1 |
Etching Mechanisms and Surface Conditions for SiOxNy Thin Films in CF4+CHF3+O-2 Inductively Coupled Plasma
Lee J, Kim J, Efremov A, Kim C, Lee HW, Kwon KH
Plasma Chemistry and Plasma Processing, 39(4), 1127, 2019 |
| 2 |
Multi-characterization study of interface passivation quality of amorphous sub-stoichiometric silicon oxide and silicon oxynitride layers for photovoltaic applications
Steffens J, Fazio MA, Cavalcoli D, Terheiden B
Solar Energy Materials and Solar Cells, 187, 104, 2018 |
| 3 |
Highly visible-light reflective SiOxNy nanowires for bright-white reflector applications
Xi S, Shi TL, Zhang L, Liu D, Lai WX, Tang ZR
Thin Solid Films, 529, 115, 2013 |
| 4 |
Silicon oxynitride thin films synthesised by the reactive gas pulsing process using rectangular pulses
Aubry E, Weber S, Billard A, Martin N
Applied Surface Science, 257(23), 10065, 2011 |
| 5 |
Catalytic CVD processes of oxidizing species and the prevention of oxidization of heated tungsten filaments by H-2
Umemoto H, Ansari SG, MoriMoto T, Setoguchi S, Uemura H, Matsumura H
Thin Solid Films, 516(5), 829, 2008 |
| 6 |
Electrical characterisation of thin silicon oxynitride films deposited by low pressure chemical vapour deposition
Hajji B, Temple-Boyer P, Olivie F, Martinez A
Thin Solid Films, 354(1-2), 9, 1999 |
