| 1 |
Low refractive index SiOF thin films prepared by reactive magnetron sputtering
Garcia-Garcia FJ, Gil-Rostra J, Terriza A, Gonzalez JC, Cotrino J, Frutos F, Ferrer FJ, Gonzalez-Elipe AR, Yubero F
Thin Solid Films, 542, 332, 2013 |
| 2 |
Fluorine-doped SiO2 and fluorocarbon low-k dielectrics investigated by SIMS
Cwil M, Kalisz M, Konarski P
Applied Surface Science, 255(4), 1334, 2008 |
| 3 |
Application of fluorine doped oxide (SiOF) spacers for improving reliability in low temperature polycrystalline thin film transistors
Feng LW, Chang TC, Liu PT, Tu CH, Wu YC, Yang CY, Chang CY
Thin Solid Films, 517(3), 1204, 2008 |
| 4 |
The origin of intrinsic stress and its relaxation for SiOF thin films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition
Kim SP, Choi SK
Thin Solid Films, 379(1-2), 259, 2000 |
| 5 |
Water absorption characteristics of fluorinated silicon oxide films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition using SiH4, SiF4 and O-2
Byun KM, Lee WJ
Thin Solid Films, 376(1-2), 26, 2000 |
| 6 |
Formation and characterization of the fluorocarbonated-SiO2 films by O-2/FTES-helicon plasma chemical vapor deposition
Oh KS, Kang MS, Lee KM, Kim DS, Choi CK, Yun SM, Chang HY, Kim KH
Thin Solid Films, 345(1), 45, 1999 |
