화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Gate patterning in 14 nm and beyond nodes: from planar devices to three dimensional Finfet devices
Meng LK, Hong PZ, He XB, Li CL, Li JJ, Li JF, Zhao C, Wei YY, Yan J
Applied Surface Science, 362, 483, 2016
2 Dry etching characteristics of GaN using Cl-2/BCl3 inductively coupled plasmas
Zhou SJ, Cao B, Liu S
Applied Surface Science, 257(3), 905, 2010
3 Trench formation on ion implanted SiC surface after thermal oxidation
Bahng W, Song GH, Kim NK, Kim SC, Kim HW, Seo KS, Kim ED
Materials Science Forum, 483, 777, 2005
4 Epitaxial lateral overgrowth of GaN on selected-area Si(111) substrate with nitrided Si mask
Naoi H, Narukawa M, Miyake H, Hiramatsu K
Journal of Crystal Growth, 248, 573, 2003