화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 4H-SiC homoepitaxy on nearly on-axis substrates using TFS-towards high quality epitaxial growth
Balachandran A, Song HZ, Sudarshan TS, Chandrashekhar MVS
Journal of Crystal Growth, 448, 97, 2016
2 Large area SiC epitaxial layer growth in a warm-wall planetary VPE reactor
Burk AA, O'Loughlin MJ, Paisley MJ, Powell AR, Brady MF, Leonard RT, Muller S, Allen ST
Materials Science Forum, 483, 137, 2005
3 Development of epitaxial SiC processes suitable for bipolar power devices
Sumakeris JJ, Das MK, Ha S, Hurt E, Irvine K, Paisley MJ, O'Loughlin MJ, Palmour JW, Skowronski M, Hobgood HM, Carter CH
Materials Science Forum, 483, 155, 2005
4 Epitaxial growth of 3C-SiC films on Si substrates by triode plasma CVD using dimethylsilane
Yasui K, Asada K, Akahane T
Applied Surface Science, 159, 556, 2000
5 Morphology control for growth of thick epitaxial 4H SiC layers
Zhang J, Ellison A, Janzen E
Materials Science Forum, 338-3, 137, 2000