화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Statistical analysis of tunnel currents in scaled MOS structures with a non-uniform oxide thickness distribution
Tyaginov SE, Vexler MI, Shulekin AF, Grekhov IV
Solid-State Electronics, 49(7), 1192, 2005
2 Impact of oxide damage on the light emission properties of MOS tunnel structures
Asli N, Shulekin AF, Yoder PD, Vexler MI, Grekhov IV, Seegebrecht P
Solid-State Electronics, 48(5), 731, 2004
3 Impact of the band-band tunneling in silicon on electrical characteristics of Al/SiO2/P+-Si structures with the sub-3 nm oxide under positive bias
El Hdiy A, Khlil R, Ziane D, Grekhov IV, Shulekin AF, Vexler MI
Solid-State Electronics, 47(4), 617, 2003
4 Current model considering oxide thickness non-uniformity in a MOS tunnel structure
Vexler MI, Shulekin AF, Dieker C, Zaporojtschenko V, Zimmermann H, Jager W, Grekhov IV, Seegebrecht P
Solid-State Electronics, 45(1), 19, 2001
5 Non-One-Dimensional Effects in Tunnel MOS Devices
Belov SV, Vexler MI, Grekhov IV, Shulekin AF
Thin Solid Films, 294(1-2), 281, 1997