검색결과 : 8건
| No. | Article |
|---|---|
| 1 |
Evaluation of extreme-ultraviolet lithography mask absorber pattern on multilayer phase defect using extreme-ultraviolet microscope Hamamoto K, Sakaya N, Hosoya M, Kureishi M, Ohkubo R, Shoki T, Nagarekawa O, Kishimoto J, Watanabe T, Kinoshita H Journal of Vacuum Science & Technology B, 27(4), 1938, 2009 |
| 2 |
Cleaning of extreme ultraviolet lithography optics and masks using 13.5 nm and 172 nm radiation Hamamoto K, Tanaka Y, Watanabe T, Sakaya N, Hosoya M, Shoki T, Hada H, Hishinuma N, Sugahara H, Kinoshita H Journal of Vacuum Science & Technology B, 23(1), 247, 2005 |
| 3 |
Mask defect inspection using an extreme ultraviolet microscope Hamamoto K, Tanaka Y, Lee SY, Hosokawa N, Sakaya N, Hosoya M, Shoki T, Watanabe T, Kinoshita H Journal of Vacuum Science & Technology B, 23(6), 2852, 2005 |
| 4 |
Actinic mask metrology for extreme ultraviolet lithography Kinoshita H, Haga T, Hamamoto K, Takada S, Kazui N, Kakunai S, Tsubakino H, Shoki T, Endo M, Watanabe T Journal of Vacuum Science & Technology B, 22(1), 264, 2004 |
| 5 |
Damage-free extreme ultraviolet mask with TaBN absorber Shoki T, Kinoshita T, Sakaya N, Hosoya M, Ohkubo R, Usui Y, Kobayshi H, Nagarekawa O Journal of Vacuum Science & Technology B, 21(6), 3021, 2003 |
| 6 |
Nanometer scattered-light alignment system using SiC x-ray masks with low optical transparency Miyatake T, Hirose M, Shoki T, Ohkubo R, Yamazaki K Journal of Vacuum Science & Technology B, 16(6), 3471, 1998 |
| 7 |
Evaluation of alignment accuracy in processed wafers and SiC masks on a scattered-light alignment system for x-ray aligners Miyatake T, Hirose M, Shoki T, Ohkubo R, Yamazaki K Journal of Vacuum Science & Technology B, 15(6), 2471, 1997 |
| 8 |
Accelerated Radiation-Damage Studies of Antireflection Materials on SiC X-Ray Mask Membrane Shoki T, Ohkubo R, Kosuga H, Yamaguchi Y, Annaka N, Wells GM, Yamazaki K, Cerrina F Journal of Vacuum Science & Technology B, 12(6), 3995, 1994 |