| 1 |
Three-Dimensionally Integrated Micro-solution Plasma: Numerical Feasibility Study and Practical Applications
Shirafuji T, Nomura A, Himeno Y
Plasma Chemistry and Plasma Processing, 34(3), 523, 2014 |
| 2 |
The 24th Symposium on Plasma Science for Materials (SPSM-24) Preface
Shirafuji T, Setsuhara Y, Shiratani M, Kaneko T, Watanabe T, Ohtake N
Thin Solid Films, 523, 1, 2012 |
| 3 |
Adhesion property of SiOx-doped Diamond-like Carbon Films Deposited on Polycarbonate by Inductively Coupled Plasma Chemical Vapor Deposition
Baek SM, Shirafuji T, Saito N, Takai O
Thin Solid Films, 519(20), 6678, 2011 |
| 4 |
Proceedings of the 21st Symposium on Plasma Science for Materials Preface
Watanabe T, Shirafuji T, Pu YK
Thin Solid Films, 518(3), 911, 2009 |
| 5 |
Plasma-enhanced chemical vapor deposition of carbon films using dibromoadamantane
Shirafuji T, Nishimura Y, Tachibana K, Ishii H
Thin Solid Films, 518(3), 993, 2009 |
| 6 |
Plasma polymerization of fluorocarbon thin films on high temperature substrate and its application to low-k films
Shirafuji T, Yoshiyasu N, Tachibana K
Thin Solid Films, 515(9), 4111, 2007 |
| 7 |
SiO2 etching with perfluorobutadiene in a dual frequency plasma reactor
Fracassi F, d'Agostino R, Fornelli E, Illuzzi F, Shirafuji T
Journal of Vacuum Science & Technology A, 21(3), 638, 2003 |
| 8 |
Improvement of SiO2/alpha-SiC interface properties by nitrogen radical treatment
Maeyama Y, Yano H, Hatayama T, Uraoka Y, Fuyuki T, Shirafuji T
Materials Science Forum, 389-3, 997, 2002 |
| 9 |
Improvement of 3C-SiC surface morphology on Si(100) by adding HCl using atmospheric CVD
Chen Y, Masuda Y, Jacob C, Shirafuji T, Nishino S
Materials Science Forum, 338-3, 257, 2000 |
| 10 |
Plasma enhanced chemical vapor deposition of thermally stable and low-dielectric-constant fluorinated amorphous carbon films using low-global-warming-potential gas C5F8
Shirafuji T, Kamisawa A, Shimasaki T, Hayashi Y, Nishino S
Thin Solid Films, 374(2), 256, 2000 |
