화학공학소재연구정보센터
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No. Article
1 Chemical vapor deposition of fluoroalkylsilane monolayer films for adhesion control in microelectromechanical systems
Mayer TM, de Boer MP, Shinn ND, Clews PJ, Michalske TA
Journal of Vacuum Science & Technology B, 18(5), 2433, 2000
2 Radiation-Induced Decomposition of Pf3 on Ru(0001)
Tao HS, Diebold U, Chakarian V, Shuh DK, Yarmoff JA, Shinn ND, Madey TE
Journal of Vacuum Science & Technology A, 13(5), 2553, 1995
3 The Influence of Preadsorbed K on the Adsorption of Pf3 on Ru(0001) Studied by Soft-X-Ray Photoelectron-Spectroscopy
Chakarian V, Shuh DK, Yarmoff JA, Tao HS, Diebold U, Maschhoff BL, Madey TE, Shinn ND
Journal of Chemical Physics, 100(7), 5301, 1994
4 Development of Surface-Acidity in Water-Oxidized Alumina Films - Ethylene Adsorption as a Function of Pretreatment Temperature
Rhodin TN, Merrill RP, Ohagan PJ, Woronick SC, Shinn ND, Woolery GL, Chester AW
Journal of Physical Chemistry, 98(9), 2433, 1994