화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Hot Carrier Effect on Gate-Induced Drain Leakage Current in n-MOSFETs with HfO2/Ti1-xNx Gate Stacks
Dai CH, Chang TC, Chu AK, Kuo YJ, Ho SH, Hsieh TY, Lo WH, Chen CE, Shih JM, Chung WL, Dai BS, Chen HM, Xia GR, Cheng O, Huang CT
Electrochemical and Solid State Letters, 15(6), H211, 2012
2 Charge trapping induced frequency-dependence degradation in n-MOSFETs with high-k/metal gate stacks
Dai CH, Chang TC, Chu AK, Kuo YJ, Hung YC, Lo WH, Ho SH, Chen CE, Shih JM, Chung WL, Chen HM, Dai BS, Tsai TM, Xia GR, Cheng O, Huang CT
Thin Solid Films, 520(5), 1511, 2011