| 1 |
Influence of dopant species and concentration on grain boundary scattering in degenerately doped In2O3 thin films
Frischbier MV, Wardenga HF, Weidner M, Bierwagen O, Jia JJ, Shigesato Y, Klein A
Thin Solid Films, 614, 62, 2016 |
| 2 |
Transparent conductive Nb-doped TiO2 films deposited by reactive dc sputtering using Ti-Nb alloy target, precisely controlled in the transition region using impedance feedback system.
Oka N, Sanno Y, Jia JJ, Nakamura S, Shigesato Y
Applied Surface Science, 301, 551, 2014 |
| 3 |
Al-doped ZnO films deposited on a slightly reduced buffer layer by reactive dc unbalanced magnetron sputtering
Kusayanagi M, Uchida A, Oka N, Jia J, Nakamura S, Shigesato Y
Thin Solid Films, 555, 93, 2014 |
| 4 |
Preface
Ginley D, Granqvist C, Kamiya T, Shigesato Y, Hosono H
Thin Solid Films, 559, 1, 2014 |
| 5 |
Study on reactive sputtering to deposit transparent conductive amorphous In2O3-ZnO films using an In-Zn alloy target
Tsukamoto N, Sensui S, Jia JJ, Oka N, Shigesato Y
Thin Solid Films, 559, 49, 2014 |
| 6 |
Work function tuning of tin-doped indium oxide electrodes with solution-processed lithium fluoride
Ow-Yang CW, Jia J, Aytun T, Zamboni M, Turak A, Saritas K, Shigesato Y
Thin Solid Films, 559, 58, 2014 |
| 7 |
Transparent conductive Al and Ga doped ZnO films deposited using off-axis sputtering
Jia JJ, Yoshimura A, Kagoya Y, Oka N, Shigesato Y
Thin Solid Films, 559, 69, 2014 |
| 8 |
Reactive-gas-flow sputter deposition of amorphous WO3 films for electrochromic devices
Oka N, Watanabe M, Sugie K, Iwabuchi Y, Kotsubo H, Shigesato Y
Thin Solid Films, 532, 1, 2013 |
| 9 |
Special Issue: 7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics (TOEO-7) Preface
Ginley D, Kamiya T, Shigesato Y, Hosono H
Thin Solid Films, 520(10), 3713, 2012 |
| 10 |
High-rate deposition of Ta-doped SnO2 films by reactive magnetron sputtering using a Sn-Ta metal-sintered target
Muto Y, Nakatomi S, Oka N, Iwabuchi Y, Kotsubo H, Shigesato Y
Thin Solid Films, 520(10), 3746, 2012 |
