검색결과 : 1건
| No. | Article |
|---|---|
| 1 |
Effect of buried Si/SiO2 interface on dopant and defect evolution in preamorphizing implant ultrashallow junction Hamilton JJ, Colombeau B, Sharp JA, Cowern NEB, Kirkby KJ, Collart EJH, Bersani M, Giubertoni D Journal of Vacuum Science & Technology B, 24(1), 442, 2006 |