검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Use of neural networks to model low-temperature tungsten etch characteristics in high density SF6 plasma Kim B, Sun JH, Choi CJ, Lee DD, Seol YS Journal of Vacuum Science & Technology A, 18(2), 417, 2000 |
| 2 |
Ar addition effect on mechanism of fluorocarbon ion formation in CF4/Ar inductively coupled plasma Choi CJ, Kwon OS, Seol YS, Kim YW, Choi IH Journal of Vacuum Science & Technology B, 18(2), 811, 2000 |
| 3 |
Mechanism of Tungsten Atom Formation in Tungsten Etchback Using SF6/Ar Helicon Plasma Choi CJ, Seol YS, Kwon OS, Baik KH Journal of the Electrochemical Society, 144(7), 2442, 1997 |