화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Dependence of electrical properties on sulfur distribution in atomic-layer-deposited HfO2 thin film on an InP substrate
Jin HS, Seok TJ, Cho DY, Park TJ
Applied Surface Science, 491, 83, 2019
2 Electrical and physicochemical properties of atomic-layer-deposited HfO2 film on Si substrate with interfacial layer grown by nitric acid oxidation
Kim SH, Seok TJ, Jin HS, Kim WB, Park TJ
Applied Surface Science, 365, 376, 2016
3 Improved interface properties of atomic-layer-deposited HfO2 film on InP using interface sulfur passivation with H2S pre-deposition annealing
Jin HS, Cho YJ, Seok TJ, Kim DH, Kim DW, Lee SM, Park JB, Yun DJ, Kim SK, Hwang CS, Park TJ
Applied Surface Science, 357, 2306, 2015
4 Fast, High-Throughput Creation of Size-Tunable Micro/Nanoparticle Clusters via Evaporative Self-Assembly in Picoliter-Scale Droplets of Particle Suspension
Choi S, Jamshidi A, Seok TJ, Wu MC, Zohdi TI, Pisano AP
Langmuir, 28(6), 3102, 2012