검색결과 : 16건
| No. | Article |
|---|---|
| 1 |
Hydrogen Reduction of MoF6 and Molybdenum Carbide Formation in RF Inductively Coupled Low-Pressure Discharge: Experiment and Equilibrium Thermodynamics Consideration Sennikov PG, Gornushkin IB, Kornev RA, Nazarov VV, Polyakov VS, Shkrunin VE Plasma Chemistry and Plasma Processing, 41(2), 673, 2021 |
| 2 |
Laser Induced Dielectric Breakdown for Chemical Vapor Deposition by Hydrogen Reduction of Volatile Boron Halides BCl(3)and BF3 Gornushkin IB, Sennikov PG, Kornev RA, Ermakov AA, Shkrunin VE Plasma Chemistry and Plasma Processing, 40(5), 1145, 2020 |
| 3 |
Laser Induced Dielectric Breakdown for Chemical Vapor Deposition by Hydrogen Reduction of Volatile Boron Halides BCl(3)and BF3 (vol 40, pg 1145, 2020) Gornushkin IB, Sennikov PG, Kornev RA, Ermakov AA, Shkrunin VE Plasma Chemistry and Plasma Processing, 40(6), 1639, 2020 |
| 4 |
99.992% Si-28 CVD-grown epilayer on 300 mm substrates for large scale integration of silicon spin qubits Mazzocchi V, Sennikov PG, Bulanov AD, Churbanov MF, Bertrand B, Hutin L, Barnes JP, Drozdov MN, Hartmann JM, Sanquer M Journal of Crystal Growth, 509, 1, 2019 |
| 5 |
Equilibrium Chemistry in BCl3-H2-Ar Plasma Gornushkin IB, Shabanov SV, Sennikov PG Plasma Chemistry and Plasma Processing, 39(4), 1087, 2019 |
| 6 |
Preparation of Boron Carbide from BF3 and BCl3 in Hydrogen Plasma of Arc RF Discharge Sennikov PG, Kornev RA, Shishkin AI Plasma Chemistry and Plasma Processing, 37(4), 997, 2017 |
| 7 |
Microwave Interferometry of Chemically Active Plasma of RF Discharge in Mixtures Based on Fluorides of Silicon and Germanium Kornev RA, Sennikov PG, Sintsov SV, Vodopyanov AV Plasma Chemistry and Plasma Processing, 37(6), 1655, 2017 |
| 8 |
Hydrogen Reduction of Germanium Tetrafluoride in RF-Discharge Kornev RA, Sennikov PG Plasma Chemistry and Plasma Processing, 35(6), 1111, 2015 |
| 9 |
Raman spectra of amorphous isotope-enriched 74Ge with low-strained Ge nanocrystals Andreev BA, Gavrilenko LV, Drozdov YN, Yunin PA, Pryakhin DA, Mochalov LA, Sennikov PG, Bulkin P, Roca i Cabarrocas P Thin Solid Films, 552, 46, 2014 |
| 10 |
Deposition of microcrystalline silicon in electron-cyclotron resonance discharge (24 GHz) plasma from silicon tetrafluoride precursor Mansfeld DA, Vodopyanov AV, Golubev SV, Sennikov PG, Mochalov LA, Andreev BA, Drozdov YN, Drozdov MN, Shashkin VI, Bulkine P, Cabarrocas PRI Thin Solid Films, 562, 114, 2014 |