검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Analytical modeling of silicon etch process in high density plasma Abdollahi-Alibeik S, McVittie JP, Saraswat KC, Sukharev V, Schoenborn P Journal of Vacuum Science & Technology A, 17(5), 2485, 1999 |
| 2 |
Microtrenching resulting from specular reflection during chlorine etching of silicon Hoekstra RJ, Kushner MJ, Sukharev V, Schoenborn P Journal of Vacuum Science & Technology B, 16(4), 2102, 1998 |