검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Plasma doping implant depth profile calculation based on ion energy distribution measurements Godet L, Fang Z, Radovanov S, Walther S, Arevalo E, Lallement F, Scheuer JT, Miller T, Lenoble D, Cartry G, Cardinaud C Journal of Vacuum Science & Technology B, 24(5), 2391, 2006 |
| 2 |
Composition of the Oxygen Plasmas from 2 Inductively-Coupled Sources Tuszewski M, Scheuer JT, Tobin JA Journal of Vacuum Science & Technology A, 13(3), 839, 1995 |
| 3 |
Plasma Immersion Ion-Implantation for Semiconductor Thin-Film Growth Tuszewski M, Scheuer JT, Campbell IH, Laurich BK Journal of Vacuum Science & Technology B, 12(2), 973, 1994 |