| 1 |
Influence of substrate bias voltage on the properties of TiO2 deposited by radio-frequency magnetron sputtering on 304L for biomaterials applications
Bait L, Azzouz L, Madaoui N, Saoula N
Applied Surface Science, 395, 72, 2017 |
| 2 |
Properties of TiO2 thin films deposited by rf reactive magnetron sputtering on biased substrates
Nezar S, Saoula N, Sali S, Faiz M, Mekki M, Laoufi NA, Tabet N
Applied Surface Science, 395, 172, 2017 |
| 3 |
Influence of substrate bias on the structure and properties of TiCN films deposited by radio-frequency magnetron sputtering
Saoula N, Madaoui N, Tadjine R, Erasmus RM, Shrivastava S, Comins JD
Thin Solid Films, 616, 521, 2016 |
| 4 |
Deposition and characterization of titanium aluminum nitride coatings prepared by RF magnetron sputtering
Ait-Djafer AZ, Saoula N, Aknouche H, Guedouar B, Madaoui N
Applied Surface Science, 350, 6, 2015 |
| 5 |
Deposition and characterization of titanium carbide thin films by magnetron sputtering using Ti and TiC targets
Djafer AZA, Saoula N, Madaoui N, Zerizer A
Applied Surface Science, 312, 57, 2014 |
| 6 |
Structural, mechanical and electrochemical comparison of TiN and TiCN coatings on XC48 steel substrates in NaCl 3.5% water solution
Madaoui N, Saoula N, Zaid B, Saidi D, Ahmed AS
Applied Surface Science, 312, 134, 2014 |
